Home / Resource / Evaluation of Damage Formation and Recovery in Ion Implanted Beta-Ga2O3 by Low Energy Cathodoluminescence

Evaluation of Damage Formation and Recovery in Ion Implanted Beta-Ga2O3 by Low Energy Cathodoluminescence

Click below to download this White Paper

Evaluation of Damage Formation and Recovery in Ion Implanted Beta-Ga2O3 by Low Energy Cathodoluminescence

Ion implantation and annealing are important process in device manufacturing. Low-energy cathodoluminescence (CL) is highly sensitive to the damage caused by ion implantation and suitable for process optimization and failure analysis in Beta-Ga2O3 based devices.


Covalent Metrology Logo

About Covalent Metrology

Covalent Metrology is a disruptive analytical services laboratory and platform based in Sunnyvale, California. Its mission is to help companies using advanced materials and nanoscale devices accelerate product development with deeper insights and better analytical data. Covalent offers comprehensive solutions and services that integrate state-of-the-art lab infrastructure, world-class experts in a wide array of analytical techniques, and modern data management and analysis.

Covalent now has over 500 customers in 30+ industries.

Learn more at: https://covalentmetrology.com