Home Resource Evaluation of Damage Formation and Recovery in Ion Implanted Beta-Ga2O3 by Low Energy Cathodoluminescence

Evaluation of Damage Formation and Recovery in Ion Implanted Beta-Ga2O3 by Low Energy Cathodoluminescence

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Evaluation of damage formation and recovery in ion implanted beta-Ga2O3 with low energy cathodoluminescence by Covalent Metrology, optimizing material properties for power electronics.

Ion implantation and annealing are important process in device manufacturing. Low-energy cathodoluminescence (CL) is highly sensitive to the damage caused by ion implantation and suitable for process optimization and failure analysis in Beta-Ga2O3 based devices.


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