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Scanning Electron Microscopy (SEM)
Scanning electron microscopy (SEM) is a surface imaging technique capable of achieving nm resolution on topographical features.
In addition to standard SEM detectors, all Covalent instruments are also outfitted with energy dispersive spectroscopy (EDS) detectors to capture quantitative elemental composition measurements, as well as 2D elemental maps, in addition to conventional SEM images.
- Top-down or cross-section imaging with nm- resolution
- Sub-nm resolution possible; see ‘high resolution’ technique variant
- Multimodal morphology characterization of surface or subsurface features
- Specimen damage can occur during imaging
Thermo Scientific Helios 5 DualBeam
- Maximum Horizontal Field Width: 2.3 mm at 4 mm WD
- Electron Beam:
- Resolution Limit: 0.7 nm at 1 kV
- Current Range: 0.8 pA to 100 nA
- Accelerating Voltage Range: 350 V to 30 kV
- Ion Beam:
- Electron Beam:
- Resolution Limit: 4.0 nm at 30 kV using preferred statistical method
- Current Range: 1 pA to 100 nA
- Accelerating Voltage Range: 500 V to 30kV
- View Instrument Spec Sheet
Thermo Scientific Scios DualBeam
- Powerful charge neutralization
- Enables analysis on magnetic samples
- Able to operate above vacuum pressure
- Versatile electromagnetic/electrostatic hybrid lens design for outstanding imaging and analysis performance
- NEOENGINE – intelligent automated electron beam control
- Advanced auto functions including beam alignment, focus, and stigmation
- In-lens field emission gun
- Aperture Angle Control Lens (ACL) for superb resolution at any kV or probe current
- Beam Deceleration (BD) mode reduces effects of lens aberrations at the sample
- Large specimen chamber with multiple ports
- Montage images and elemental maps
- Smile View Lab for data management and report generation
- Live Analysis with integrated JEOL EDS elemental screening
- High spatial resolution imaging and analysis of nanostructures
- Solid phase
- Conductive samples yield best results; insulating materials must be coated
- Maximum lateral dimension: 150 mm
- Larger samples (up to 300 mm) can be accommodated through a network partner; please contact us for more details
- Maximum vertical height: 55 mm
- Maximum sample mass: 500 g
- Vacuum stable
To generate electron images – called micrographs – a highly focused electron beam is scanned over the surface of a specimen. As it scans, the beam interacts with the sample to produce several detectable signals (different types of photons and electrons) through elastic and inelastic scattering events.
The intensities of these signals depend predominantly on the atomic number of the scattering atom, and the adjacent surface topography. Each signal is affected by these factors slightly differently, and the SEM can be calibrated to detect one or two signals at a time.
As the electron beam is scanned, the active detector(s) measure the intensity of the selected signal(s) at each pixel, and correlate these to a grayscale value.
When the scan is complete, the system outputs an image that captures topographical (and sometimes relative atomic number) information.
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