Stereoscopic Scanning Electron Microscopy (SSEM): A Breakthrough Alternative for High-Res Surface Profilometry
By leveraging stereoscopic 3D reconstruction from SEM images, Stereoscopic Scanning Electron Microscopy (SSEM / stereo-SEM) can produce surface data that rivals the precision of Atomic Force Microscopy (AFM) and Laser Confocal Microscopy (LSCM), offering a powerful tool for detailed surface analysis.
This webinar will explore the operational principles of these three advanced techniques, their limitations and advantages, and how SSEM stands as a compelling alternative in high-resolution surface profilometry.
Learning Objectives
By the end of this webinar, attendees will:
- Understand Surface Profilometry Techniques: Gain a broad understanding of how SSEM, AFM, and LSCM work, including their underlying principles and methodologies.
- Recognize Limitations and Advantages: Identify and compare the strengths and weaknesses of each technique with real-world examples.
- Application-Specific Insights: Learn which applications benefit most from high-resolution surface profilometry and how to choose the best technique based on a project’s requirements.
- Data Comparison and Analysis: Learn what to expect from SSEM, AFM, and LSCM: both in terms of the raw output data from the tools and subsequent profilometry measurements.
- Evaluating SSEM’s Efficacy: Evaluate the performance of stereoscopic SEM in comparison to AFM and LSCM, understanding where SSEM excels and why it’s particularly useful for certain applications.
Who Should Attend
This webinar is designed for professionals and researchers in materials science, surface analysis, electronics or device development, and nanotechnology.
Whether you’re currently using AFM, LSCM, have never heard of SSEM or are even considering adopting SSEM, this webinar will provide valuable insights into the latest advancements in surface profilometry techniques.
Meet Stereo-SEM: the new Profilometry technique on the block…
In materials science and surface analysis, surface profilometry plays a crucial role in understanding the nanoscale topographical features and roughness variations in otherwise smooth, flat surfaces. Such features or roughness can play a major role in the performance of contacts, bond pads, and other functionalized surfaces across many technology industries.
Traditionally, Atomic Force Microscopy (AFM) and Laser Scanning Confocal Microscopy (LSCM) have been the go-to (and often only) techniques capable of this high-resolution surface profilometry. However, a new alternative has emerged: Stereoscopic Scanning Electron Microscopy (SEM). This technique facilitates 3D reconstruction of the sample surface with spatial and depth resolutions comparable to AFM and LSCM, while introducing key advantages.
Join in this webinar to learn what distinguishes SSEM from conventional profilometry approaches, as well as when and why you should use each technique for your surface characterization work!
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About the Speaker
Kevin Wu
Electron Microscopy Metrology Manager, Covalent Metrology
Kevin joined Covalent in 2020 and has since been promoted to Metrology Manager for his distinguished work with the company’s electron microscopy and failure analysis teams. He is an expert in both SEM and TEM, as well as related techniques (EDX/EDS, FIB-SEM, EBSD), and XRD.
Prior to joining Covalent, Kevin spent many years performing microscopy and failure analysis in vacuum electronic devices at Communications and Power Industries. His breadth of experience includes raw material evaluation, materials processing, metallurgy, and failure analysis with a focus primarily in metals and other hard materials.
Kevin received an M.S and B.S. in Materials Science and Engineering at the University of California, Berkeley.